Electron field emission from Ti-containing tetrahedral amorphous carbon films deposited by filtered cathodic vacuum arc

Xing Zhao Ding, Y. J. Li, Z. Sun, B. K. Tay, Shu Ping Lau, G. Y. Chen, W. Y. Cheung, S. P. Wong

Research output: Journal article publicationJournal articleAcademic researchpeer-review

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Titanium-containing tetrahedral amorphous carbon (ta-C:Ti) films with different titanium content were deposited by a filtered cathodic vacuum arc technique. The microstructure of these films was confirmed to be of ta-C+TiCx(x<1) nanocomposite by Rutherford backscattering spectroscopy, x-ray diffraction, and micro-Raman spectroscopy experiments. With the increase of titanium content, the titanium carbide content increased and the sp3fraction in the residual ta-C phase decreased gradually. In the electron field emission tests, it was found that proper conditioning processes are necessary for all these films in order to get a steady reproducible emission behavior. After conditioning, the emission threshold field of the films is about the same value, around 10 V/μm, except for the film with the lowest titanium content (∼1.2 at%) of which the threshold field is much higher, around 17-18 V/μm. The optimum titanium concentration in the film for field emission, showing the highest emission current and emission site density, is about 12 at%. After field emission testing, graphitization was involved and the titanium carbide phase, at least some of the sub-stoichiometric TiCxphase, in the ta-C:Ti films decomposed.
Original languageEnglish
Pages (from-to)6842-6847
Number of pages6
JournalJournal of Applied Physics
Issue number11
Publication statusPublished - 1 Dec 2000
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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