Electrode effects on the breakdown characteristics of high-k HfO2metal-insulator-metal capacitors

Wing Man Tang, M. G. Helander, M. T. Greiner, W. T. Ng, Z. H. Lu

Research output: Chapter in book / Conference proceedingConference article published in proceeding or bookAcademic researchpeer-review

1 Citation (Scopus)

Abstract

The effects of top metal contacts on the leakage current and breakdown characteristics of HfO2metal-insulator-metal (MIM) capacitors were investigated. It is found that the breakdown field strength of the devices scales with the work function of the top electrode; the higher the metal work function the higher the breakdown field strength of the devices. This observation is attributed to the different barrier height formed at the contacting metal/HfO2interfaces, which results in various amount of charge injected into the HfO2dielectrics. The joule heating from these injected charges increases the defect density leading to dielectric breakdown.
Original languageEnglish
Title of host publication2010 IEEE International Conference of Electron Devices and Solid-State Circuits, EDSSC 2010
DOIs
Publication statusPublished - 1 Dec 2010
Externally publishedYes
Event2010 IEEE International Conference of Electron Devices and Solid-State Circuits, EDSSC 2010 - Hong Kong, Hong Kong
Duration: 15 Dec 201017 Dec 2010

Conference

Conference2010 IEEE International Conference of Electron Devices and Solid-State Circuits, EDSSC 2010
Country/TerritoryHong Kong
CityHong Kong
Period15/12/1017/12/10

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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