Efficient self-assembly of transition metal oxide nanoclusters on silicon substrates

Linyou Cao, Yang Chai, Pingjian Li, Zhiyong Shen, Jinlei Wu

Research output: Journal article publicationJournal articleAcademic researchpeer-review

5 Citations (Scopus)


Self-assembled monolayers (SAMs) of nanoclusters (< 10 nm) on silicon wafer have been prepared via simply immersing the substrate into a FeCl3/HCl solution. The clusters are hydrous iron oxide resulting from the hydrolysis of FeCl3, and their deposition is driven by the electrostatic attraction between the clusters and the substrate, the surface groups of which are oppositely charged at suitable pH value. HCl is used to enhance the repulsive force among the clusters and cause them uniformly distributed; in this regard, it can be replaced by KCl, NH4Cl, or NH2•HCl. This result provides a general guidance to prepare self-assemblies of transition metal oxide nanoclusters onto silicon substrates and others with appropriate hydroxyl (-OH) groups.
Original languageEnglish
Pages (from-to)13-18
Number of pages6
JournalThin Solid Films
Issue number1-2
Publication statusPublished - 1 Dec 2005
Externally publishedYes


  • Electrostatic interaction
  • Nanoparticles
  • Self-assembly
  • Transition metal oxide

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces


Dive into the research topics of 'Efficient self-assembly of transition metal oxide nanoclusters on silicon substrates'. Together they form a unique fingerprint.

Cite this