Effect of post-annealing on laser-ablation deposited WS2 thin films

  • H. Wang
  • , S. M. Ng
  • , H. F. Wong
  • , W. C. Wong
  • , K. K. Lam
  • , Y. K. Liu
  • , L. F. Fei
  • , Y. B. Zhou
  • , C. L. Mak
  • , Y. Wang
  • , C. W. Leung

Research output: Journal article publicationJournal articleAcademic researchpeer-review

Abstract

We deposited WS2 thin films by pulsed laser deposition on sapphire substrates at room temperature, and studied the effect of post-annealing temperature on the quality of the WS2 films. By comparing the full-width-at-half-maximum of the characteristic WS2 Raman peaks, we explored the relationship between the post-annealing temperature and the crystallinity of WS2 films. Optoelectronic measurements conducted on post-annealed WS2 film-based photodetectors showed improvement with rising annealing temperatures. Our study revealed the possibility of preparing large-area dichalcogenides for optoelectronic applications.

Original languageEnglish
Pages (from-to)239-242
Number of pages4
JournalVacuum
Volume152
DOIs
Publication statusPublished - Jun 2018

Keywords

  • Post-annealing
  • Pulsed laser deposition
  • Raman spectroscopy
  • WS

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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