Effect of plasma treatment on surface properties of TiO2nanoparticulate films

Yaan Cao, Qingjiu Meng, Wensheng Yang, Jianghong Yao, Yongchun Shu, Wei Wang, Guohua Chen

Research output: Journal article publicationJournal articleAcademic researchpeer-review

21 Citations (Scopus)

Abstract

TiO2nanoparticle films were prepared by plasma-enhanced chemical vapor deposition, and subsequently, their surfaces were treated by TiCl4and O2plasmas, respectively. Experiments of phenol photodegradation show that the TiO2film treated by O2plasma presents much higher photocatalytic activity than that treated by TiCl4plasma. X-ray photoelectron spectral analyses indicate that more active species, such as O2-, are formed on surface of the film treated by O2plasma than that treated by TiCl4plasma. The energy levels of the surface species and the photogenerated electronic transitions via these surface species are further investigated by surface photovoltage spectra (SPS) and electric field-induced surface photovoltage spectra (EFISPS).
Original languageEnglish
Pages (from-to)181-186
Number of pages6
JournalColloids and Surfaces A: Physicochemical and Engineering Aspects
Volume262
Issue number1-3
DOIs
Publication statusPublished - 15 Jul 2005
Externally publishedYes

Keywords

  • PCVD
  • Photocatalytic activity
  • Surface species
  • TiO nanoparticulate film 2

ASJC Scopus subject areas

  • Surfaces and Interfaces
  • Physical and Theoretical Chemistry
  • Colloid and Surface Chemistry

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