Keyphrases
X-ray Photoelectron Spectroscopy
100%
Sputtering Gas
100%
Internal Stress
100%
Gas Pressure
100%
Deposition Conditions
100%
Internal Microstructure
100%
Tungsten Nitride
100%
Nitride Films
100%
Microstructure
50%
Structural Properties
50%
In Situ
50%
Stoichiometry
50%
Annealing
50%
Cross-sectional Transmission Electron Microscopy
50%
Transmission Electron Microscopy
50%
High-resolution Electron Energy Loss Spectroscopy (HREELS)
50%
Bonding Character
50%
Amorphous Phase
50%
Gas Mixture
50%
As-deposited Films
50%
Electron Microscopy Studies
50%
Nitrogen Incorporation
50%
Thick Film
50%
Crystallization
50%
Single-phase Structure
50%
Microstructural Characteristics
50%
Deposited Film
50%
Nitrogen Partial Pressure
50%
Curvature Measurement
50%
Nitrogen Concentration
50%
In Situ X-ray Diffraction
50%
N2 Gas
50%
Stress Generation
50%
Substrate Curvature
50%
Density Feature
50%
Ionic Bond
50%
Phase Forming
50%
Two-phase Structure
50%
Bonding Feature
50%
Material Science
Tungsten
100%
Nitride Compound
100%
Film
100%
Phase Structure
33%
Transmission Electron Microscopy
33%
X-Ray Photoelectron Spectroscopy
33%
Electron Energy Loss Spectrometry
16%
Structural Property
16%
X-Ray Diffraction
16%
Density
16%
Amorphous Material
16%
Ionic Bonding
16%
Thin Films
16%
Gas Mixture
16%
Thick Films
16%