Edge Delamination of Monolayer Transition Metal Dichalcogenides

Thuc Hue Ly, Seok Joon Yun, Quoc Huy Thi, Jiong Zhao

Research output: Journal article publicationJournal articleAcademic researchpeer-review

21 Citations (Scopus)

Abstract

Delamination of thin films from the supportive substrates is a critical issue within the thin film industry. The emergent two-dimensional, atomic layered materials, including transition metal dichalcogenides, are highly flexible; thus buckles and wrinkles can be easily generated and play vital roles in the corresponding physical properties. Here we introduce one kind of patterned buckling behavior caused by the delamination from a substrate initiated at the edges of the chemical vapor deposition synthesized monolayer transition metal dichalcogenides, led by thermal expansion mismatch. The atomic force microscopy and optical characterizations clearly showed the puckered structures associated with the strain, whereas the transmission electron microscopy revealed the special sawtooth-shaped edges, which break the geometrical symmetry for the buckling behavior of hexagonal samples. The condition of the edge delamination is in accordance with the fracture behavior of thin film interfaces. This edge delamination and buckling process is universal for most ultrathin two-dimensional materials, which requires more attention in various future applications.
Original languageEnglish
Pages (from-to)7534-7541
Number of pages8
JournalACS Nano
Volume11
Issue number7
DOIs
Publication statusPublished - 25 Jul 2017

Keywords

  • AFM
  • edge delaminate
  • molybdenum disulfide
  • PL
  • TEM
  • tungsten disulfide

ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)
  • Physics and Astronomy(all)

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