Ease distribution in relation to the X-line style jacket. Part 2: Application to pattern alteration

Zhaohui Wang, E. Newton, Keng Po Roger Ng, W. Zhang

Research output: Journal article publicationJournal articleAcademic researchpeer-review

13 Citations (Scopus)


A model of ease distribution in relation to the X-line style jacket has been developed in Part 1 of this two-part series of articles. The prediction of segmental girth ease allowance (SGEA) was carried out using the ease distribution model (EDM). The EDM was verified by comparing the deviations of the predicted SGEA with four extra jackets in different dimensions. Based on the distribution of SGEA, pattern alteration could be implemented by effectively adding the SGEA into basic block at the corresponding position instead of adding girth ease allowance at the edge of the pattern. The pattern alteration using the EDM was evaluated by comparing 18 parameters of newly produced patterns with those of draped patterns. The fitting of the patterns was visually assessed by three experts in garment design. Finally, the advantages and disadvantages of the proposed model are discussed.
Original languageEnglish
Pages (from-to)257-264
Number of pages8
JournalJournal of the Textile Institute
Issue number3
Publication statusPublished - 28 Jun 2006


  • Ease allowance
  • Ease distribution
  • Garment
  • Pattern design

ASJC Scopus subject areas

  • Materials Science (miscellaneous)
  • General Agricultural and Biological Sciences
  • Polymers and Plastics
  • Industrial and Manufacturing Engineering


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