TY - GEN
T1 - DynaMask
T2 - 2023 IEEE/CVF Conference on Computer Vision and Pattern Recognition, CVPR 2023
AU - Li, Ruihuang
AU - He, Chenhang
AU - Li, Shuai
AU - Zhang, Yabin
AU - Zhang, Lei
N1 - Publisher Copyright:
© 2023 IEEE.
PY - 2023
Y1 - 2023
N2 - The representative instance segmentation methods mostly segment different object instances with a mask of the fixed resolution, e.g., 28 × 28 grid. However, a low-resolution mask loses rich details, while a high-resolution mask incurs quadratic computation overhead. It is a challenging task to predict the optimal binary mask for each instance. In this paper, we propose to dynamically select suitable masks for different object proposals. First, a dual-level Feature Pyramid Network (FPN) with adaptive feature aggregation is developed to gradually increase the mask grid resolution, ensuring high-quality segmentation of objects. Specifically, an efficient region-level top-down path (r-FPN) is introduced to incorporate complementary contextual and detailed information from different stages of image-level FPN (i-FPN). Then, to alleviate the increase of computation and memory costs caused by using large masks, we develop a Mask Switch Module (MSM) with negligible computational cost to select the most suitable mask resolution for each instance, achieving high efficiency while maintaining high segmentation accuracy. Without bells and whistles, the proposed method, namely DynaMask, brings consistent and noticeable performance improvements over other state-of-the-arts at a moderate computation overhead. The source code: https://github.com/lslrh/DynaMask.
AB - The representative instance segmentation methods mostly segment different object instances with a mask of the fixed resolution, e.g., 28 × 28 grid. However, a low-resolution mask loses rich details, while a high-resolution mask incurs quadratic computation overhead. It is a challenging task to predict the optimal binary mask for each instance. In this paper, we propose to dynamically select suitable masks for different object proposals. First, a dual-level Feature Pyramid Network (FPN) with adaptive feature aggregation is developed to gradually increase the mask grid resolution, ensuring high-quality segmentation of objects. Specifically, an efficient region-level top-down path (r-FPN) is introduced to incorporate complementary contextual and detailed information from different stages of image-level FPN (i-FPN). Then, to alleviate the increase of computation and memory costs caused by using large masks, we develop a Mask Switch Module (MSM) with negligible computational cost to select the most suitable mask resolution for each instance, achieving high efficiency while maintaining high segmentation accuracy. Without bells and whistles, the proposed method, namely DynaMask, brings consistent and noticeable performance improvements over other state-of-the-arts at a moderate computation overhead. The source code: https://github.com/lslrh/DynaMask.
KW - grouping and shape analysis
KW - Segmentation
UR - https://www.scopus.com/pages/publications/85170433836
U2 - 10.1109/CVPR52729.2023.01085
DO - 10.1109/CVPR52729.2023.01085
M3 - Conference article published in proceeding or book
AN - SCOPUS:85170433836
T3 - Proceedings of the IEEE Computer Society Conference on Computer Vision and Pattern Recognition
SP - 11279
EP - 11288
BT - 2023 IEEE/CVF Conference on Computer Vision and Pattern Recognition (CVPR)
PB - IEEE Computer Society
Y2 - 18 June 2023 through 22 June 2023
ER -