Direct optical patterning of poly(dimethylsiloxane) microstructures for microfluidic chips

Shaorui Gao, Wing Tai Tung, Dexter S. Wong, Liming Bian, Aping Zhang

Research output: Chapter in book / Conference proceedingConference article published in proceeding or bookAcademic researchpeer-review

Abstract

� 2016 SPIE. In this paper, we present an optical maskless exposure approach for direct patterning of large-area high resolution microfluidic chips using photosensitive poly(dimethylsiloxane) (PDMS) materials. Both positive- and negative-tone photosensitive PDMS (photoPDMS) were successfully patterned into various microfluidic devices with complex geometries by using an optical maskless lithography process. The positive-tone PDMS is used for patterning of largearea chips, while the negative-tone PDMS is demonstrated to fabricate high-resolution microstructures and on-chip devices. With the seamless pattern-stitching technique, a large-area microfluidic chip with size of 5.5 � 2.8 cm2with complex three-dimensional (3D) staggered herringbone mixers (SHMs) for micro-flow gradient generation has been directly fabricated within 125 minutes by using the positive-tone PDMS. A small microfluidic chip with feature size as small as 5 μm is demonstrated by using the negative-tone PDMS. The experimental results reveal that the optical maskless lithography technology enables to rapidly pattern high-resolution microstructures and is very promising for development of lab-on-a-chip devices.
Original languageEnglish
Title of host publication8th International Symposium on Advanced Optical Manufacturing and Testing Technologies
Subtitle of host publicationDesign, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials
PublisherSPIE
Volume9685
ISBN (Electronic)9781628419207
DOIs
Publication statusPublished - 1 Jan 2016
Event8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials, AOMATT 2016 - Suzhou International Conference Center, Suzhou, China
Duration: 26 Apr 201629 Apr 2016

Conference

Conference8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials, AOMATT 2016
Country/TerritoryChina
CitySuzhou
Period26/04/1629/04/16

Keywords

  • direct patterning
  • microfluidics
  • optical maskless lithography
  • photosensitive poly(dimethylsiloxane)

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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