Direct optical patterning of poly(dimethylsiloxane) microstructures for microfluidic chips

Shaorui Gao; Wing Tai Tung; Dexter S. Wong; Liming Bian; Aping Zhang

doi:10.1117/12.2243464

Direct optical patterning of poly(dimethylsiloxane) microstructures for microfluidic chips

Shaorui Gao, Wing Tai Tung, Dexter S. Wong, Liming Bian, Aping Zhang

The Hong Kong Polytechnic University

Research output: Chapter in book / Conference proceeding › Conference article published in proceeding or book › Academic research › peer-review

Abstract

ï¿½ 2016 SPIE. In this paper, we present an optical maskless exposure approach for direct patterning of large-area high resolution microfluidic chips using photosensitive poly(dimethylsiloxane) (PDMS) materials. Both positive- and negative-tone photosensitive PDMS (photoPDMS) were successfully patterned into various microfluidic devices with complex geometries by using an optical maskless lithography process. The positive-tone PDMS is used for patterning of largearea chips, while the negative-tone PDMS is demonstrated to fabricate high-resolution microstructures and on-chip devices. With the seamless pattern-stitching technique, a large-area microfluidic chip with size of 5.5 ï¿½ 2.8 cm2with complex three-dimensional (3D) staggered herringbone mixers (SHMs) for micro-flow gradient generation has been directly fabricated within 125 minutes by using the positive-tone PDMS. A small microfluidic chip with feature size as small as 5 μm is demonstrated by using the negative-tone PDMS. The experimental results reveal that the optical maskless lithography technology enables to rapidly pattern high-resolution microstructures and is very promising for development of lab-on-a-chip devices.

Original language	English
Title of host publication	8th International Symposium on Advanced Optical Manufacturing and Testing Technologies
Subtitle of host publication	Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials
Publisher	SPIE
Volume	9685
ISBN (Electronic)	9781628419207
DOIs	https://doi.org/10.1117/12.2243464
Publication status	Published - 1 Jan 2016
Event	8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials, AOMATT 2016 - Suzhou International Conference Center, Suzhou, China Duration: 26 Apr 2016 → 29 Apr 2016

Conference

Conference	8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials, AOMATT 2016
Country/Territory	China
City	Suzhou
Period	26/04/16 → 29/04/16

Keywords

direct patterning
microfluidics
optical maskless lithography
photosensitive poly(dimethylsiloxane)

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

More information

10.1117/12.2243464

http://hdl.handle.net/10397/101971

Cite this

Gao, S., Tung, W. T., Wong, D. S., Bian, L., & Zhang, A. (2016). Direct optical patterning of poly(dimethylsiloxane) microstructures for microfluidic chips. In 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials (Vol. 9685). Article 96850X SPIE. https://doi.org/10.1117/12.2243464

Gao, Shaorui ; Tung, Wing Tai ; Wong, Dexter S. et al. / Direct optical patterning of poly(dimethylsiloxane) microstructures for microfluidic chips. 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials. Vol. 9685 SPIE, 2016.

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abstract = "{\"i}¿½ 2016 SPIE. In this paper, we present an optical maskless exposure approach for direct patterning of large-area high resolution microfluidic chips using photosensitive poly(dimethylsiloxane) (PDMS) materials. Both positive- and negative-tone photosensitive PDMS (photoPDMS) were successfully patterned into various microfluidic devices with complex geometries by using an optical maskless lithography process. The positive-tone PDMS is used for patterning of largearea chips, while the negative-tone PDMS is demonstrated to fabricate high-resolution microstructures and on-chip devices. With the seamless pattern-stitching technique, a large-area microfluidic chip with size of 5.5 {\"i}¿½ 2.8 cm2with complex three-dimensional (3D) staggered herringbone mixers (SHMs) for micro-flow gradient generation has been directly fabricated within 125 minutes by using the positive-tone PDMS. A small microfluidic chip with feature size as small as 5 μm is demonstrated by using the negative-tone PDMS. The experimental results reveal that the optical maskless lithography technology enables to rapidly pattern high-resolution microstructures and is very promising for development of lab-on-a-chip devices.",

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Gao, S, Tung, WT, Wong, DS, Bian, L & Zhang, A 2016, Direct optical patterning of poly(dimethylsiloxane) microstructures for microfluidic chips. in 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials. vol. 9685, 96850X, SPIE, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials, AOMATT 2016, Suzhou, China, 26/04/16. https://doi.org/10.1117/12.2243464

Direct optical patterning of poly(dimethylsiloxane) microstructures for microfluidic chips. / Gao, Shaorui; Tung, Wing Tai; Wong, Dexter S. et al.
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials. Vol. 9685 SPIE, 2016. 96850X.

Research output: Chapter in book / Conference proceeding › Conference article published in proceeding or book › Academic research › peer-review

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AU - Bian, Liming

AU - Zhang, Aping

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N2 - ï¿½ 2016 SPIE. In this paper, we present an optical maskless exposure approach for direct patterning of large-area high resolution microfluidic chips using photosensitive poly(dimethylsiloxane) (PDMS) materials. Both positive- and negative-tone photosensitive PDMS (photoPDMS) were successfully patterned into various microfluidic devices with complex geometries by using an optical maskless lithography process. The positive-tone PDMS is used for patterning of largearea chips, while the negative-tone PDMS is demonstrated to fabricate high-resolution microstructures and on-chip devices. With the seamless pattern-stitching technique, a large-area microfluidic chip with size of 5.5 ï¿½ 2.8 cm2with complex three-dimensional (3D) staggered herringbone mixers (SHMs) for micro-flow gradient generation has been directly fabricated within 125 minutes by using the positive-tone PDMS. A small microfluidic chip with feature size as small as 5 μm is demonstrated by using the negative-tone PDMS. The experimental results reveal that the optical maskless lithography technology enables to rapidly pattern high-resolution microstructures and is very promising for development of lab-on-a-chip devices.

AB - ï¿½ 2016 SPIE. In this paper, we present an optical maskless exposure approach for direct patterning of large-area high resolution microfluidic chips using photosensitive poly(dimethylsiloxane) (PDMS) materials. Both positive- and negative-tone photosensitive PDMS (photoPDMS) were successfully patterned into various microfluidic devices with complex geometries by using an optical maskless lithography process. The positive-tone PDMS is used for patterning of largearea chips, while the negative-tone PDMS is demonstrated to fabricate high-resolution microstructures and on-chip devices. With the seamless pattern-stitching technique, a large-area microfluidic chip with size of 5.5 ï¿½ 2.8 cm2with complex three-dimensional (3D) staggered herringbone mixers (SHMs) for micro-flow gradient generation has been directly fabricated within 125 minutes by using the positive-tone PDMS. A small microfluidic chip with feature size as small as 5 μm is demonstrated by using the negative-tone PDMS. The experimental results reveal that the optical maskless lithography technology enables to rapidly pattern high-resolution microstructures and is very promising for development of lab-on-a-chip devices.

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M3 - Conference article published in proceeding or book

VL - 9685

BT - 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies

PB - SPIE

T2 - 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials, AOMATT 2016

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ER -

Gao S, Tung WT, Wong DS, Bian L, Zhang A. Direct optical patterning of poly(dimethylsiloxane) microstructures for microfluidic chips. In 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials. Vol. 9685. SPIE. 2016. 96850X doi: 10.1117/12.2243464

Direct optical patterning of poly(dimethylsiloxane) microstructures for microfluidic chips

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