Abstract
This paper presents the design and development of a MEMS based, capacitive sensor for micro-force measurement. The sensor has an overall dimension of 3600 μm × 1000 μm × 10 μm and was fabricated using the Micragem fabrication process. A displacement reduction mechanism is incorporated in this sensor design to increase the sensitivity of the sensor. Analysis from Finite Element software, COMSOL, confirms that a 10:1 displacement reduction ratio is achievable with this mechanism. Simulation results show that the sensor is capable of measuring a maximum force input of 11 milli-Newton, resulting from a 20-μm displacement on the sensing structure. A 6-DOF manipulator and an evaluation board were used to experimentally verify the performance the sensor. Experimental results show that a capacitance change of approximately 175 to 200 fF can be observed from a 20-μm displacement.
| Original language | English |
|---|---|
| Title of host publication | 2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings |
| Pages | 29-33 |
| Number of pages | 5 |
| DOIs | |
| Publication status | Published - 1 Dec 2007 |
| Externally published | Yes |
| Event | 2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007 - Hong Kong, Hong Kong Duration: 2 Aug 2007 → 5 Aug 2007 |
Conference
| Conference | 2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007 |
|---|---|
| Country/Territory | Hong Kong |
| City | Hong Kong |
| Period | 2/08/07 → 5/08/07 |
Keywords
- Capacitive
- Displacement reduction mechanism
- Force sensor
- MEMS
- Micragem
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Atomic and Molecular Physics, and Optics
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