Design of a high sensitivity capacitive force sensor

Kar Hang Chu, James K. Mills, William L. Cleghorn

Research output: Chapter in book / Conference proceedingConference article published in proceeding or bookAcademic researchpeer-review

8 Citations (Scopus)

Abstract

This paper presents the design and development of a MEMS based, capacitive sensor for micro-force measurement. The sensor has an overall dimension of 3600 μm × 1000 μm × 10 μm and was fabricated using the Micragem fabrication process. A displacement reduction mechanism is incorporated in this sensor design to increase the sensitivity of the sensor. Analysis from Finite Element software, COMSOL, confirms that a 10:1 displacement reduction ratio is achievable with this mechanism. Simulation results show that the sensor is capable of measuring a maximum force input of 11 milli-Newton, resulting from a 20-μm displacement on the sensing structure. A 6-DOF manipulator and an evaluation board were used to experimentally verify the performance the sensor. Experimental results show that a capacitance change of approximately 175 to 200 fF can be observed from a 20-μm displacement.
Original languageEnglish
Title of host publication2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007, Proceedings
Pages29-33
Number of pages5
DOIs
Publication statusPublished - 1 Dec 2007
Externally publishedYes
Event2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007 - Hong Kong, Hong Kong
Duration: 2 Aug 20075 Aug 2007

Conference

Conference2007 7th IEEE International Conference on Nanotechnology - IEEE-NANO 2007
CountryHong Kong
CityHong Kong
Period2/08/075/08/07

Keywords

  • Capacitive
  • Displacement reduction mechanism
  • Force sensor
  • MEMS
  • Micragem

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Atomic and Molecular Physics, and Optics

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