Design and fabrication of zinc oxide thin-film ridge waveguides on silicon substrate with ultraviolet amplified spontaneous emission

Siu Fung Yu, Clement Yuen, Shu Ping Lau, W. J. Fan

Research output: Journal article publicationJournal articleAcademic researchpeer-review

10 Citations (Scopus)


Zinc oxide (ZnO) thin-film ridge waveguides have been designed and fabricated on n-type (100) silicon substrate. A filtered cathodic vacuum arc technique is used to deposit high-crystal-quality ZnO thin films on lattice-mismatched silicon substrates at 230°C. A ridge waveguide of width ∼ 2 μm and height ∼ 0.1 μm is defined on the ZnO thin film by plasma etching. Room-temperature amplified spontaneous emission is observed with peak wavelength at ∼385 nm under 355-nm optical excitation. It is found that the net optical gain of the ZnO thin-film ridge waveguides can be as large as 120 cm-1at a pump intensity of ∼ 1.9 MW/cm2.
Original languageEnglish
Pages (from-to)406-412
Number of pages7
JournalIEEE Journal of Quantum Electronics
Issue number4
Publication statusPublished - 1 Apr 2004
Externally publishedYes


  • Amplified spontaneous emission
  • Filtered cathodic vacuum arc technique
  • Optical waveguide
  • Ultraviolet emission
  • Zinc oxide

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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