Deep UV lithography for pillar type nanophotonic crystal

Selin H.G. Teo, A. Q. Liu, G. L. Sia, Chao Lu, J. Singh, M. B. Yu, H. Q. Sun

Research output: Journal article publicationJournal articleAcademic researchpeer-review

5 Citations (Scopus)


The progress made to resolve challenges met in using deep UV lithography for batch fabrication of pillar type nano-photonic crystals is described, using data from experiments carried out based on two degrees, full factorial design of experiments and subsequently processed using variance analysis. A binary mask without phase shift features was used to obtain information on effects of lithographic parameters such as antireflection coatings, resist preparation recipes, exposure latitude and depth of focus biases. The results derived hence enabled successful derivations of high quality arrays of dense nano-pillars.
Original languageEnglish
Pages (from-to)559-566
Number of pages8
JournalInternational Journal of Nanoscience
Issue number4
Publication statusPublished - 1 Aug 2005
Externally publishedYes


  • Deep UV lithography
  • Nanofabrication
  • Photonic crystal

ASJC Scopus subject areas

  • Biotechnology
  • Bioengineering
  • Materials Science(all)
  • Condensed Matter Physics
  • Computer Science Applications
  • Electrical and Electronic Engineering

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