CVD in weakly rarefied rotating disk flows

Keyphrases

• Silane 100%
• Silylenes 100%
• Rotating Disk Flow 100%
• Deposition Rate 66%
• Temperature Slip 66%
• Low Temperature 33%
• High Temperature 33%
• Reaction Mechanism 33%
• Slip Boundary Condition 33%
• Value-based 33%
• Continuum Model 33%
• Velocity Slip 33%
• Surface Reaction 33%
• Rarefied Gas Flow 33%
• Sticking Coefficient 33%
• Concentration Slip 33%
• Silicon Deposition 33%
• Gas-phase Decomposition 33%
• Rarefied Effect 33%

Engineering

• Chemical Vapor Deposition 100%
• Deposition Rate 100%
• Rotating Disk 100%
• Low-Temperature 50%
• Gas-Phase 50%
• Continuum Model 50%
• Reaction Model 50%
• Boundary Condition 50%
• Rarefied Gas 50%