Abstract
Oriented patterns, e.g. fingerprints, consist of smoothly varying flow-like patterns, together with important singular points (i.e. cores and deltas) where the orientation changes abruptly. Gabor filters and anisotropic diffusion methods have been widely used to enhance oriented patterns. However, none of them can well cope with regions of varying curvatures or regions surrounding singular points. By incorporating the ridge curvatures and the singularities into the diffusion model, we propose a new diffusion method to better exploit the global characteristics of oriented patterns. Specifically, we first locate the singular points, and regularize the estimated orientation field by using a singularity driven nonlinear diffusion process. We then enhance the oriented patterns by applying an oriented diffusion process which is driven by the curvature and singularity. Experiments on synthetic data and real fingerprint images validated that the proposed method is capable of consistently enhancing oriented patterns while well preserving the ridge structures in singular regions.
Original language | English |
---|---|
Title of host publication | 2009 IEEE Computer Society Conference on Computer Vision and Pattern Recognition Workshops, CVPR Workshops 2009 |
Publisher | IEEE Computer Society |
Pages | 2129-2135 |
Number of pages | 7 |
Volume | 2009 IEEE Computer Society Conference on Computer Vision and Pattern Recognition |
ISBN (Print) | 9781424439935 |
DOIs | |
Publication status | Published - 1 Jan 2009 |
Event | 2009 IEEE Computer Society Conference on Computer Vision and Pattern Recognition - Miami, FL, United States Duration: 20 Jun 2009 → 25 Jun 2009 |
Conference
Conference | 2009 IEEE Computer Society Conference on Computer Vision and Pattern Recognition |
---|---|
Country/Territory | United States |
City | Miami, FL |
Period | 20/06/09 → 25/06/09 |
ASJC Scopus subject areas
- Computer Vision and Pattern Recognition
- Biomedical Engineering