Crystallization-induced stress in tungsten nitride thin films

Y. G. Shen; Y. W. Mai

doi:10.1023/A:1006775821012

Crystallization-induced stress in tungsten nitride thin films

Research output: Journal article publication › Journal article › Academic research › peer-review

Abstract

Direct measurement of the stress evolution is reported during reactive magnetron sputtering of WN_x using a wafer curvature-based technique. It was found that the film stress changes significantly from compressive to tensile during crystallization. The nitrogen concentration in the films was determined by X-ray photoelectron spectroscopy.

Original language	English
Pages (from-to)	1941-1943
Number of pages	3
Journal	Journal of Materials Science Letters
Volume	19
Issue number	21
DOIs	https://doi.org/10.1023/A:1006775821012
Publication status	Published - Nov 2000
Externally published	Yes

ASJC Scopus subject areas

General Materials Science

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10.1023/A:1006775821012

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title = "Crystallization-induced stress in tungsten nitride thin films",

abstract = "Direct measurement of the stress evolution is reported during reactive magnetron sputtering of WNx using a wafer curvature-based technique. It was found that the film stress changes significantly from compressive to tensile during crystallization. The nitrogen concentration in the films was determined by X-ray photoelectron spectroscopy.",

author = "Shen, {Y. G.} and Mai, {Y. W.}",

year = "2000",

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doi = "10.1023/A:1006775821012",

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AU - Mai, Y. W.

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AB - Direct measurement of the stress evolution is reported during reactive magnetron sputtering of WNx using a wafer curvature-based technique. It was found that the film stress changes significantly from compressive to tensile during crystallization. The nitrogen concentration in the films was determined by X-ray photoelectron spectroscopy.

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DO - 10.1023/A:1006775821012

M3 - Journal article

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JO - Journal of Materials Science Letters

JF - Journal of Materials Science Letters

IS - 21

ER -

Crystallization-induced stress in tungsten nitride thin films

Abstract

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