Crystallization-induced stress in reactively sputter-deposited molybdenum nitride thin films

Keyphrases

• Sputter-deposited 100%
• Crystallization 100%
• Induced Stress 100%
• Molybdenum Nitride 100%
• Nitride Films 100%
• Average Grain Size 33%
• X Ray Diffraction 33%
• Atomic Force Microscopy 33%
• Annealing Temperature 33%
• Stress Increment 33%
• High-resolution Electron Energy Loss Spectroscopy (HREELS) 33%
• Gas Mixture 33%
• Residual Stress 33%
• Densification 33%
• Stoichiometric Composition 33%
• Curvature-based 33%
• Amorphous Films 33%
• Stress Development 33%
• Electron Diffraction 33%
• Volumetric Shrinkage 33%
• N2 Gas 33%
• Development Mechanism 33%
• Wafer Curvature 33%
• DC Reactive Magnetron Sputtering 33%

Material Science

• Molybdenum 100%
• Nitride Compound 100%
• Film 100%
• Thin Films 100%
• Residual Stress 25%
• Electron Energy Loss Spectrometry 25%
• Electron Diffraction 25%
• Magnetron Sputtering 25%
• Grain Size 25%
• X-Ray Diffraction 25%
• Amorphous Film 25%
• Atomic Force Microscopy 25%
• Phase Composition 25%
• Gas Mixture 25%