Comparison of interfacial and electrical characteristics of HfO2and HfAlO high-k dielectrics on compressively strained Si1-xGex

K. K.S. Curreem, P. F. Lee, K. S. Wong, J. Y. Dai, M. J. Zhou, J. Wang, Quan Li

Research output: Journal article publicationJournal articleAcademic researchpeer-review

40 Citations (Scopus)

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Material Science