Comparative study of plasma spray flow fields and particle behavior near to flat inclined substrates

C.W. Kang, H.W. Ng, Ching Man Yu

Research output: Journal article publicationJournal articleAcademic researchpeer-review

20 Citations (Scopus)

Abstract

Numerical models have been developed using computational fluid dynamics (CFD) analysis program FLUENT V6.02© to investigate the effect of the substrate on the behavior of the plasma flow fields and in-flight particles. Simulations are performed for cases where flat substrates are either present or absent, for the former, the substrate is oriented perpendicularly or inclined to the torch axis. It is shown that although the presence of perpendicular or inclined substrate significantly influences the plasma flow fields at the vicinity of the substrate, the particle behavior remain relatively unaffected. The insignificant effect of the substrate on particle behavior is qualitatively verified by experimental observation using Spray Watch© imaging diagnostics equipment. Images captured by the equipment confirm that the particles travel through the plasma plume with high momentum and show no sudden change in their trajectories light before impacting the substrate. Both the numerical and experimental findings show that the freestream model is sufficiently detailed for future work of this nature.
Original languageEnglish
Pages (from-to)149-175
Number of pages27
JournalPlasma Chemistry and Plasma Processing
Volume26
Issue number2
DOIs
Publication statusPublished - 1 Apr 2006
Externally publishedYes

Keywords

  • Atmospheric plasma spray
  • CFD modeling
  • Inclined substrate
  • Particle behavior

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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