Colossal permittivity properties of Zn,Nb co-doped TiO2with different phase structures

Xianhua Wei, Wenjing Jie, Zhibin Yang, Fengang Zheng, Huizhong Zeng, Yun Liu, Jianhua Hao

Research output: Journal article publicationJournal articleAcademic researchpeer-review

99 Citations (Scopus)

Abstract

Colossal permittivity properties were studied in Zn,Nb co-doped TiO2with different phase structures. The (Zn1/3Nb2/3)0.05Ti0.95O2rutile ceramics were prepared by the solid state sintering technique, while the amorphous and anatase films were respectively fabricated by a pulsed laser deposition method and a subsequent rapid thermal annealing. The ceramics showed a frequency (102-106Hz) independent dielectric response with a colossal dielectric permittivity (∼30 000), and a relatively low dielectric loss (∼0.05) at room temperature. The excellent colossal permittivity properties are comparable to those of the previously reported rutile TiO2ceramics by co-doping trivalent and pentavalent elements. For amorphous films, the dielectric permittivity decreased, and the dielectric loss increased slightly compared to those of the ceramics. Compared with the amorphous thin films, the annealed anatase ones exhibited a simultaneous increase in both dielectric permittivity and loss at low frequency while kept almost unchanged at high frequency. These results suggest that co-doping of bivalent elements with Nb into TiO2with various phase structures can yield colossal permittivity effects, including ultra-high dielectric permittivity, relatively low dielectric loss. Furthermore, the colossal permittivity properties may be mainly attributed to the effect of the electron-pinned defect-dipoles in Zn,Nb co-doped TiO2with different phase structures rather than the grain boundary capacitance effect. Besides, the frequency and bias dependent dielectric properties were also investigated in thin film forms, which could be affected by the electrode-film interface and mobile ions. Our results are helpful for not only investigating the new class of colossal permittivity materials, but also developing dielectric thin film device applications.
Original languageEnglish
Pages (from-to)11005-11010
Number of pages6
JournalJournal of Materials Chemistry C
Volume3
Issue number42
DOIs
Publication statusPublished - 21 Sept 2015

ASJC Scopus subject areas

  • General Chemistry
  • Materials Chemistry

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