Coexistence of hexagonal and orthorhombic structures in NiSi films containing Pt

Jiyan Dai, D. Mangelinck, S. K. Lahiri

Research output: Journal article publicationJournal articleAcademic researchpeer-review

11 Citations (Scopus)


The structure of Ni(Pt)Si films was investigated using high-resolution electron microscopy (HREM), electron microdiffraction and image simulation techniques. Such films with 5 at. % Pt were sputter deposited onto (111) Si and annealed for l min at 500°C by rapid thermal annealing. Analysis of the HREM pictures, diffraction patterns, and simulation results has revealed that NiSi films containing Pt can assume both hexagonal and orthorhombic structures that can coexist in the same film. The presence of film stresses and Pt seems to play a role in the formation of hexagonal NiSi.
Original languageEnglish
Pages (from-to)2214-2216
Number of pages3
JournalApplied Physics Letters
Issue number15
Publication statusPublished - 11 Oct 1999
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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