TY - JOUR
T1 - Chemical Composition of Gas and Particle Phase Products of Toluene Photooxidation Reaction under High OH Exposure Condition
AU - Lau, Yik-Sze
AU - Chan, Man-Nin
AU - Poon, Hon-Yin
AU - Tan, Yan
AU - Lee, Shuncheng
AU - Li, Jianjun
AU - Ho, Kin-Fai
N1 - Funding Information:
Funding: This study was supported by grants from the Research Grant Council of the Hong Kong Special Administrative Region China, Theme-Based Research Scheme (T24-504/17-N) and General Research Fund (Project No. CUHK 14205318).
Publisher Copyright:
© 2021 by the authors. Licensee MDPI, Basel, Switzerland.
PY - 2021/7/15
Y1 - 2021/7/15
N2 - In the current study, the photooxidation reaction of toluene (C7H8) was investigated in a Potential Aerosol Mass Oxidation Flow Reactor (PAM OFR). The hydroxyl radical (OH) exposure of toluene in the PAM OFR ranged from 0.4 to 1.4 × 1012 molec cm−3 s, which is equivalent to 3 to 12 days of atmospheric oxidation. A proton transfer reaction-mass spectrometer (PTR-MS) and a scanning mobility particle sizer (SMPS) were used to study the gas-phase products formed and particle number changes of the oxidation reaction in PAM OFR. The secondary organic aerosol (SOA) formed in the PAM OFR was also collected for off-line chemical analysis. Key gas-phase reaction products of toluene, including glyoxal, methyl glyoxal, unsaturated carbonyl compounds, and benzaldehyde, were identified by the PTR-MS. Second generation products, including acetic acid, formaldehyde, formic acid, and acetaldehyde, were also detected. By comparing the mass spectrums obtained under different OH exposures and relative humidity (RH), changes in the two parameters have minimal effects on the composition of gas-phase products formed, expect for the spectrum obtained at OH exposure of 0.4 × 1012 cm−3 s and RH = 17%, which is slightly different from other spectrums. SMPS results showed that particle mass concentration increases with increasing OH exposure, while particle number concentration first increases and then decreases with increasing OH exposure. This result probably suggests the formation of oligomers at high OH exposure conditions. Off-line chemical analysis of the SOA sample was dominated by C4 diacids, including malic acid, citramalic acid, and tartaric acid. The well-known toluene SOA marker 2,3-Dihydroxy-4-oxopentanoic acid, as well as 2,3-dihydroxyglutaric acid, which has not been identified in previous toluene photooxidation experiments, were also detected in the SOA sample. Our results showed good agreements with the results of previous smog chamber studies of toluene photooxidation reaction, and they suggested that using PAM OFR for studies of oxidation reaction of different VOCs can be atmospherically relevant.
AB - In the current study, the photooxidation reaction of toluene (C7H8) was investigated in a Potential Aerosol Mass Oxidation Flow Reactor (PAM OFR). The hydroxyl radical (OH) exposure of toluene in the PAM OFR ranged from 0.4 to 1.4 × 1012 molec cm−3 s, which is equivalent to 3 to 12 days of atmospheric oxidation. A proton transfer reaction-mass spectrometer (PTR-MS) and a scanning mobility particle sizer (SMPS) were used to study the gas-phase products formed and particle number changes of the oxidation reaction in PAM OFR. The secondary organic aerosol (SOA) formed in the PAM OFR was also collected for off-line chemical analysis. Key gas-phase reaction products of toluene, including glyoxal, methyl glyoxal, unsaturated carbonyl compounds, and benzaldehyde, were identified by the PTR-MS. Second generation products, including acetic acid, formaldehyde, formic acid, and acetaldehyde, were also detected. By comparing the mass spectrums obtained under different OH exposures and relative humidity (RH), changes in the two parameters have minimal effects on the composition of gas-phase products formed, expect for the spectrum obtained at OH exposure of 0.4 × 1012 cm−3 s and RH = 17%, which is slightly different from other spectrums. SMPS results showed that particle mass concentration increases with increasing OH exposure, while particle number concentration first increases and then decreases with increasing OH exposure. This result probably suggests the formation of oligomers at high OH exposure conditions. Off-line chemical analysis of the SOA sample was dominated by C4 diacids, including malic acid, citramalic acid, and tartaric acid. The well-known toluene SOA marker 2,3-Dihydroxy-4-oxopentanoic acid, as well as 2,3-dihydroxyglutaric acid, which has not been identified in previous toluene photooxidation experiments, were also detected in the SOA sample. Our results showed good agreements with the results of previous smog chamber studies of toluene photooxidation reaction, and they suggested that using PAM OFR for studies of oxidation reaction of different VOCs can be atmospherically relevant.
KW - Ageing
KW - PTR-MS
KW - Photooxidation
KW - Potential Aerosol Mass (PAM)
KW - Toluene
UR - http://www.scopus.com/inward/record.url?scp=85111111155&partnerID=8YFLogxK
U2 - 10.3390/atmos12070915
DO - 10.3390/atmos12070915
M3 - Journal article
SN - 2073-4433
VL - 12
JO - ATMOSPHERE
JF - ATMOSPHERE
IS - 7
M1 - 915
ER -