Characterization of (Ti, Al)N films deposited by off-plane double bend filtered cathodic vacuum arc

Y. H. Cheng, B. K. Tay, Shu Ping Lau, X. Shi, H. C. Chua

Research output: Journal article publicationJournal articleAcademic researchpeer-review

3 Citations (Scopus)

Abstract

At room temperature, an off-plane double bend filtered cathodic vacuum arc technique is used to deposit (Ti,Al)N films under a nitrogen atmosphere. The surface morphology of the deposited films is analyzed using SEM and atomic force microscopy. The films are also studied based on their composition and bond structure using XPS.
Original languageEnglish
Pages (from-to)557-562
Number of pages6
JournalJournal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume19
Issue number2
DOIs
Publication statusPublished - 1 Mar 2001
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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