Broadband source with high power supported by the combined effects of EDFA, Raman scattering and parametric process

Fuyun Lu, Zhaohui Li, Yu Fan, Xiao Hann Lim, Jian Chen, Chao Lu

Research output: Chapter in book / Conference proceedingConference article published in proceeding or bookAcademic researchpeer-review

Abstract

A broadband source (1520-1620nm) with output power of more than 200mW is achieved using only a single-wavelength pumping scheme dependent on the combined effects of stimulated Raman scattering, parametric process, and Erbium-doped fiber amplification.
Original languageEnglish
Title of host publicationAdvanced Laser Technologies 2005
Volume6344 I
DOIs
Publication statusPublished - 21 Sept 2006
Externally publishedYes
EventAdvanced Laser Technologies 2005 - Tianjin, China
Duration: 3 Sept 20056 Sept 2005

Conference

ConferenceAdvanced Laser Technologies 2005
Country/TerritoryChina
CityTianjin
Period3/09/056/09/05

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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