Arrays of nanoscale lenses for subwavelength optical lithography

Jae Won Jang; Zijian Zheng; One Sun Lee; Wooyoung Shim; Gengfeng Zheng; George C. Schatz; Chad A. Mirkin

doi:10.1021/nl101942s

Arrays of nanoscale lenses for subwavelength optical lithography

Jae Won Jang, Zijian Zheng, One Sun Lee, Wooyoung Shim, Gengfeng Zheng, George C. Schatz, Chad A. Mirkin

The Hong Kong Polytechnic University

Research output: Journal article publication › Journal article › Academic research › peer-review

49 Citations (Scopus)

Abstract

Poly(ethylene glycol) (PEG) polymer lens arrays are made by using dip-pen nanolithography to deposit nanoscale PEG features on hydrophobically modified quartz glass. The dimensions of the PEG lenses are controlled by tuning dwell time and polymer molecular weight. The PEG polymer lenses on the quartz substrate act as a phase-shift photomask for fabricating subwavelength scale features, ∼100 nm in width. Depending upon UV irradiation time during the photolithography, the photoresist nanostructures can be transitioned from well-shaped (short time) to ring-shaped (long time) features. The technique can be used to pattern large areas through the use of cantilever arrays.

Original language	English
Pages (from-to)	4399-4404
Number of pages	6
Journal	Nano Letters
Volume	10
Issue number	11
DOIs	https://doi.org/10.1021/nl101942s
Publication status	Published - 10 Nov 2010

Keywords

Dip-pen
finite element method
lens
lithography
nano
phase-shift
photomask
photoresist
poly(ethylene glycol)
simulation

ASJC Scopus subject areas

Bioengineering
General Chemistry
General Materials Science
Condensed Matter Physics
Mechanical Engineering

More information

10.1021/nl101942s

Cite this

@article{c01bb295e3324e89a4b351a65f8f98bf,

title = "Arrays of nanoscale lenses for subwavelength optical lithography",

abstract = "Poly(ethylene glycol) (PEG) polymer lens arrays are made by using dip-pen nanolithography to deposit nanoscale PEG features on hydrophobically modified quartz glass. The dimensions of the PEG lenses are controlled by tuning dwell time and polymer molecular weight. The PEG polymer lenses on the quartz substrate act as a phase-shift photomask for fabricating subwavelength scale features, ∼100 nm in width. Depending upon UV irradiation time during the photolithography, the photoresist nanostructures can be transitioned from well-shaped (short time) to ring-shaped (long time) features. The technique can be used to pattern large areas through the use of cantilever arrays.",

keywords = "Dip-pen, finite element method, lens, lithography, nano, phase-shift, photomask, photoresist, poly(ethylene glycol), simulation",

author = "Jang, {Jae Won} and Zijian Zheng and Lee, {One Sun} and Wooyoung Shim and Gengfeng Zheng and Schatz, {George C.} and Mirkin, {Chad A.}",

year = "2010",

month = nov,

day = "10",

doi = "10.1021/nl101942s",

language = "English",

volume = "10",

pages = "4399--4404",

journal = "Nano Letters",

issn = "1530-6984",

publisher = "American Chemical Society",

number = "11",

}

TY - JOUR

T1 - Arrays of nanoscale lenses for subwavelength optical lithography

AU - Jang, Jae Won

AU - Zheng, Zijian

AU - Lee, One Sun

AU - Shim, Wooyoung

AU - Zheng, Gengfeng

AU - Schatz, George C.

AU - Mirkin, Chad A.

PY - 2010/11/10

Y1 - 2010/11/10

N2 - Poly(ethylene glycol) (PEG) polymer lens arrays are made by using dip-pen nanolithography to deposit nanoscale PEG features on hydrophobically modified quartz glass. The dimensions of the PEG lenses are controlled by tuning dwell time and polymer molecular weight. The PEG polymer lenses on the quartz substrate act as a phase-shift photomask for fabricating subwavelength scale features, ∼100 nm in width. Depending upon UV irradiation time during the photolithography, the photoresist nanostructures can be transitioned from well-shaped (short time) to ring-shaped (long time) features. The technique can be used to pattern large areas through the use of cantilever arrays.

AB - Poly(ethylene glycol) (PEG) polymer lens arrays are made by using dip-pen nanolithography to deposit nanoscale PEG features on hydrophobically modified quartz glass. The dimensions of the PEG lenses are controlled by tuning dwell time and polymer molecular weight. The PEG polymer lenses on the quartz substrate act as a phase-shift photomask for fabricating subwavelength scale features, ∼100 nm in width. Depending upon UV irradiation time during the photolithography, the photoresist nanostructures can be transitioned from well-shaped (short time) to ring-shaped (long time) features. The technique can be used to pattern large areas through the use of cantilever arrays.

KW - Dip-pen

KW - finite element method

KW - lens

KW - lithography

KW - nano

KW - phase-shift

KW - photomask

KW - photoresist

KW - poly(ethylene glycol)

KW - simulation

UR - http://www.scopus.com/inward/record.url?scp=78449295493&partnerID=8YFLogxK

U2 - 10.1021/nl101942s

DO - 10.1021/nl101942s

M3 - Journal article

C2 - 20879780

SN - 1530-6984

VL - 10

SP - 4399

EP - 4404

JO - Nano Letters

JF - Nano Letters

IS - 11

ER -

Arrays of nanoscale lenses for subwavelength optical lithography

Abstract

Keywords

ASJC Scopus subject areas

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