Application of a graphene buffer layer for the growth of high quality SnS films on GaAs(100) substrate

W. Wang; K. K. Leung; W. K. Fong; S. F. Wang; Y. Y. Hui; Shu Ping Lau; C. Surya

doi:10.1109/PVSC.2012.6318130

Application of a graphene buffer layer for the growth of high quality SnS films on GaAs(100) substrate

W. Wang, K. K. Leung, W. K. Fong, S. F. Wang, Y. Y. Hui, Shu Ping Lau, C. Surya

Research output: Chapter in book / Conference proceeding › Conference article published in proceeding or book › Academic research › peer-review

Abstract

Tin mono-sulfide (SnS) thin films have been grown by molecular beam epitaxy (MBE) on two different substrates, GaAs (100) and soda lime glass at 400°C. High resolution X-ray Diffraction (HXRD) and Scanning Electron Microscopy (SEM) are used to characterize the structural properties of the as grown SnS films. By introducing a graphene buffer layer between the SnS thin film and the substrate, the XRD rocking curve's full width at half maximum (FWHM) of the SnS film grown on GaAs (100) and soda lime glass decrease from 2.92°to 0.37°and from 6.58°to 2.04°respectively, indicating a significant improvement of SnS thin films.

Original language	English
Title of host publication	Program - 38th IEEE Photovoltaic Specialists Conference, PVSC 2012
Pages	2614-2616
Number of pages	3
DOIs	https://doi.org/10.1109/PVSC.2012.6318130
Publication status	Published - 26 Nov 2012
Event	38th IEEE Photovoltaic Specialists Conference, PVSC 2012 - Austin, TX, United States Duration: 3 Jun 2012 → 8 Jun 2012

Conference

Conference	38th IEEE Photovoltaic Specialists Conference, PVSC 2012
Country	United States
City	Austin, TX
Period	3/06/12 → 8/06/12

Keywords

Gallium arsenide
graphene
molecular beam epitaxy
scanning electron microscopy
X-ray diffraction

ASJC Scopus subject areas

Control and Systems Engineering
Industrial and Manufacturing Engineering
Electrical and Electronic Engineering

More information

10.1109/PVSC.2012.6318130

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title = "Application of a graphene buffer layer for the growth of high quality SnS films on GaAs(100) substrate",

abstract = "Tin mono-sulfide (SnS) thin films have been grown by molecular beam epitaxy (MBE) on two different substrates, GaAs (100) and soda lime glass at 400°C. High resolution X-ray Diffraction (HXRD) and Scanning Electron Microscopy (SEM) are used to characterize the structural properties of the as grown SnS films. By introducing a graphene buffer layer between the SnS thin film and the substrate, the XRD rocking curve's full width at half maximum (FWHM) of the SnS film grown on GaAs (100) and soda lime glass decrease from 2.92°to 0.37°and from 6.58°to 2.04°respectively, indicating a significant improvement of SnS thin films.",

keywords = "Gallium arsenide, graphene, molecular beam epitaxy, scanning electron microscopy, X-ray diffraction",

author = "W. Wang and Leung, {K. K.} and Fong, {W. K.} and Wang, {S. F.} and Hui, {Y. Y.} and Lau, {Shu Ping} and C. Surya",

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}

Wang, W, Leung, KK, Fong, WK, Wang, SF, Hui, YY, Lau, SP & Surya, C 2012, Application of a graphene buffer layer for the growth of high quality SnS films on GaAs(100) substrate. in Program - 38th IEEE Photovoltaic Specialists Conference, PVSC 2012., 6318130, pp. 2614-2616, 38th IEEE Photovoltaic Specialists Conference, PVSC 2012, Austin, TX, United States, 3/06/12. https://doi.org/10.1109/PVSC.2012.6318130

Application of a graphene buffer layer for the growth of high quality SnS films on GaAs(100) substrate. / Wang, W.; Leung, K. K.; Fong, W. K.; Wang, S. F.; Hui, Y. Y.; Lau, Shu Ping; Surya, C.

Program - 38th IEEE Photovoltaic Specialists Conference, PVSC 2012. 2012. p. 2614-2616 6318130.

Research output: Chapter in book / Conference proceeding › Conference article published in proceeding or book › Academic research › peer-review

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AU - Wang, W.

AU - Leung, K. K.

AU - Fong, W. K.

AU - Wang, S. F.

AU - Hui, Y. Y.

AU - Lau, Shu Ping

AU - Surya, C.

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AB - Tin mono-sulfide (SnS) thin films have been grown by molecular beam epitaxy (MBE) on two different substrates, GaAs (100) and soda lime glass at 400°C. High resolution X-ray Diffraction (HXRD) and Scanning Electron Microscopy (SEM) are used to characterize the structural properties of the as grown SnS films. By introducing a graphene buffer layer between the SnS thin film and the substrate, the XRD rocking curve's full width at half maximum (FWHM) of the SnS film grown on GaAs (100) and soda lime glass decrease from 2.92°to 0.37°and from 6.58°to 2.04°respectively, indicating a significant improvement of SnS thin films.

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KW - graphene

KW - molecular beam epitaxy

KW - scanning electron microscopy

KW - X-ray diffraction

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Application of a graphene buffer layer for the growth of high quality SnS films on GaAs(100) substrate

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Conference

Keywords

ASJC Scopus subject areas

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