Anisotropy of weak ferromagnetism of HfAlOxfilm deposited by magnetron sputtering

G. D. Zhou; S. Y. Zhang; Y. T. Tu; J. Li; P. Chen; Jiyan Dai; X. Y. Qiu

doi:10.1080/10584587.2012.663652

Anisotropy of weak ferromagnetism of HfAlO_xfilm deposited by magnetron sputtering

G. D. Zhou, S. Y. Zhang, Y. T. Tu, J. Li, P. Chen, Jiyan Dai, X. Y. Qiu

Research output: Journal article publication › Conference article › Academic research › peer-review

Original language	English
Article number	663652
Pages (from-to)	13-15
Number of pages	3
Journal	Integrated Ferroelectrics
Volume	134
Issue number	1
DOIs	https://doi.org/10.1080/10584587.2012.663652
Publication status	Published - 24 May 2012
Event	International Symposium on Integrated Functionalities, ISIF 2011 - Cambridge, United Kingdom Duration: 31 Jul 2011 → 4 Aug 2011

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Control and Systems Engineering
Ceramics and Composites
Condensed Matter Physics
Electrical and Electronic Engineering
Materials Chemistry

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10.1080/10584587.2012.663652

Cite this

@article{75e0c5ac3d44419bbe7b1c6bd04deff8,

title = "Anisotropy of weak ferromagnetism of HfAlOxfilm deposited by magnetron sputtering",

author = "Zhou, {G. D.} and Zhang, {S. Y.} and Tu, {Y. T.} and J. Li and P. Chen and Jiyan Dai and Qiu, {X. Y.}",

year = "2012",

month = may,

day = "24",

doi = "10.1080/10584587.2012.663652",

language = "English",

volume = "134",

pages = "13--15",

journal = "Integrated Ferroelectrics",

issn = "1058-4587",

publisher = "Taylor and Francis Ltd.",

number = "1",

note = "International Symposium on Integrated Functionalities, ISIF 2011 ; Conference date: 31-07-2011 Through 04-08-2011",

}

TY - JOUR

T1 - Anisotropy of weak ferromagnetism of HfAlOxfilm deposited by magnetron sputtering

AU - Zhou, G. D.

AU - Zhang, S. Y.

AU - Tu, Y. T.

AU - Li, J.

AU - Chen, P.

AU - Dai, Jiyan

AU - Qiu, X. Y.

PY - 2012/5/24

Y1 - 2012/5/24

UR - http://www.scopus.com/inward/record.url?scp=84862096190&partnerID=8YFLogxK

U2 - 10.1080/10584587.2012.663652

DO - 10.1080/10584587.2012.663652

M3 - Conference article

SN - 1058-4587

VL - 134

SP - 13

EP - 15

JO - Integrated Ferroelectrics

JF - Integrated Ferroelectrics

IS - 1

M1 - 663652

T2 - International Symposium on Integrated Functionalities, ISIF 2011

Y2 - 31 July 2011 through 4 August 2011

ER -

Anisotropy of weak ferromagnetism of HfAlOxfilm deposited by magnetron sputtering

ASJC Scopus subject areas

More information

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Anisotropy of weak ferromagnetism of HfAlO_xfilm deposited by magnetron sputtering