Anisotropy of weak ferromagnetism of HfAlOxfilm deposited by magnetron sputtering

G. D. Zhou, S. Y. Zhang, Y. T. Tu, J. Li, P. Chen, Jiyan Dai, X. Y. Qiu

Research output: Journal article publicationConference articleAcademic researchpeer-review

1 Citation (Scopus)
Original languageEnglish
Article number663652
Pages (from-to)13-15
Number of pages3
JournalIntegrated Ferroelectrics
Issue number1
Publication statusPublished - 24 May 2012
EventInternational Symposium on Integrated Functionalities, ISIF 2011 - Cambridge, United Kingdom
Duration: 31 Jul 20114 Aug 2011

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Control and Systems Engineering
  • Ceramics and Composites
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

Cite this