Achievement of controlled resistive response of nanogapped palladium film to hydrogen

M. Zhao; M. H. Wong; Chung Wo Ong

doi:10.1063/1.4927394

Achievement of controlled resistive response of nanogapped palladium film to hydrogen

M. Zhao, M. H. Wong, Chung Wo Ong

Research output: Journal article publication › Journal article › Academic research › peer-review

16 Citations (Scopus)

Abstract

Palladium (Pd) film containing nanogaps of well controlled dimension was fabricated on a Si wafer having a high-aspect-ratio micropillar. The Pd film was arranged to experience hydrogen (H₂)-induced volume expansion. (i) If the nanogap is kept open, its width is narrowed down. A discharge current was generated to give a strong, fast, and repeatable on-off type resistive switching response. (ii) If the nanogap is closed, the cross section of the conduction path varies to give continuous H₂-concentration dependent resistive response. The influence of stresses and related physical mechanisms are discussed.

Original language	English
Article number	033108
Journal	Applied Physics Letters
Volume	107
Issue number	3
DOIs	https://doi.org/10.1063/1.4927394
Publication status	Published - 20 Jul 2015

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.4927394

http://hdl.handle.net/10397/9618

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AB - Palladium (Pd) film containing nanogaps of well controlled dimension was fabricated on a Si wafer having a high-aspect-ratio micropillar. The Pd film was arranged to experience hydrogen (H2)-induced volume expansion. (i) If the nanogap is kept open, its width is narrowed down. A discharge current was generated to give a strong, fast, and repeatable on-off type resistive switching response. (ii) If the nanogap is closed, the cross section of the conduction path varies to give continuous H2-concentration dependent resistive response. The influence of stresses and related physical mechanisms are discussed.

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Achievement of controlled resistive response of nanogapped palladium film to hydrogen

Abstract

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