Abstract
Copper phthalocyanine-based organic thin-film transistors (OTFTs) using ZrTaO high-k gate dielectric with different Ta contents have been fabricated and characterized. It is found that devices with more Ta incorporated in the dielectric film exhibit better electrical properties such as smaller leakage current density, larger breakdown field strength, smaller sub-threshold slope and larger on/off ratio. The involved mechanism lies in that increasing Ta concentration can reduce the interfacial trap density and increase the formation of Al-O bonds in interfacial layer resulting in better interface properties.
Original language | English |
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Title of host publication | 2013 IEEE International Conference of Electron Devices and Solid-State Circuits, EDSSC 2013 |
DOIs | |
Publication status | Published - 23 Dec 2013 |
Event | 2013 IEEE International Conference of Electron Devices and Solid-State Circuits, EDSSC 2013 - Hong Kong, Hong Kong Duration: 3 Jun 2013 → 5 Jun 2013 |
Conference
Conference | 2013 IEEE International Conference of Electron Devices and Solid-State Circuits, EDSSC 2013 |
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Country/Territory | Hong Kong |
City | Hong Kong |
Period | 3/06/13 → 5/06/13 |
Keywords
- CuPc
- High-k dielectric ZrTaO
- OTFT
ASJC Scopus subject areas
- Hardware and Architecture
- Electrical and Electronic Engineering