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A self-limited large-displacement-ratio micromechanical amplifier

  • J. Li
  • , Z. S. Liu
  • , C. Lu
  • , Q. X. Zhang
  • , A. Q. Liu

Research output: Chapter in book / Conference proceedingConference article published in proceeding or bookAcademic researchpeer-review

Abstract

A micromechanical amplifier with large-displacement-ratio and self-limited output as a result of bifurcation effect is reported in this paper. The large output displacement is achieved by amplifying a small input motion through the elastic deformation of the compliant configuration, which realizes the self-limited output by bifurcation effect. The configuration of the compliant microstructures is analyzed with the results of as high as 100 times displacement magnification and self-limitation by bifurcation effect, Such kind of amplifier is fabricated by employing deep reactive ion etching (DRIE) process demonstrating the 52.0-μm-output displacement when the input displacement is only 0.96 um with the displacement ratio of 54.2. Thereafter, the output displacement maintains stable due to the bifurcation effect.

Original languageEnglish
Title of host publicationTRANSDUCERS '05 - 13th International Conference on Solid-State Sensors and Actuators and Microsystems - Digest of Technical Papers
Pages725-728
Number of pages4
DOIs
Publication statusPublished - Jun 2005
Externally publishedYes
Event13th International Conference on Solid-State Sensors and Actuators and Microsystems, TRANSDUCERS '05 - Seoul, Korea, Republic of
Duration: 5 Jun 20059 Jun 2005

Publication series

NameDigest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05
Volume1

Conference

Conference13th International Conference on Solid-State Sensors and Actuators and Microsystems, TRANSDUCERS '05
Country/TerritoryKorea, Republic of
CitySeoul
Period5/06/059/06/05

Keywords

  • Bifurcation effect
  • Large displacement ratio
  • Micromechanical amplifier
  • Self-Limited

ASJC Scopus subject areas

  • General Engineering

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