A polyferroplatinyne precursor for the rapid fabrication of L10-FePt-type bit patterned media by nanoimprint lithography

Qingchen Dong; Guijun Li; Cheuk Lam Ho; Mahtab Faisal; Chi Wah Leung; Philip Wing Tat Pong; Kun Liu; Ben Zhong Tang; Ian Manners; Wai Yeung Wong

doi:10.1002/adma.201104171

A polyferroplatinyne precursor for the rapid fabrication of L1₀-FePt-type bit patterned media by nanoimprint lithography

Qingchen Dong, Guijun Li, Cheuk Lam Ho, Mahtab Faisal, Chi Wah Leung, Philip Wing Tat Pong, Kun Liu, Ben Zhong Tang, Ian Manners, Wai Yeung Wong

Research output: Journal article publication › Journal article › Academic research › peer-review

133 Citations (Scopus)

Abstract

A polyferroplatinyne polymer can be patterned on the surface of Si wafer in ordered nanoline or nanodot shapes with PDMS molds through nanoimprint lithography (NIL), and subsequent thermal treatment gives rise to the nanopatterned arrays of L10-FePt nanoparticles with the same periodicities. The method offers excellent potential to be utilized in the simple and rapid fabrication of bit patterned media for magnetic data recording.

Original language	English
Pages (from-to)	1034-1040
Number of pages	7
Journal	Advanced Materials
Volume	24
Issue number	8
DOIs	https://doi.org/10.1002/adma.201104171
Publication status	Published - 21 Feb 2012

Keywords

bit patterned media
FePt nanoparticles
magnetic data recording
metallopolymers
nanoimprint lithography

ASJC Scopus subject areas

General Materials Science
Mechanics of Materials
Mechanical Engineering

More information

10.1002/adma.201104171

Cite this

@article{26c44c824fa14ebba02dae1dbde88d65,

title = "A polyferroplatinyne precursor for the rapid fabrication of L10-FePt-type bit patterned media by nanoimprint lithography",

abstract = "A polyferroplatinyne polymer can be patterned on the surface of Si wafer in ordered nanoline or nanodot shapes with PDMS molds through nanoimprint lithography (NIL), and subsequent thermal treatment gives rise to the nanopatterned arrays of L10-FePt nanoparticles with the same periodicities. The method offers excellent potential to be utilized in the simple and rapid fabrication of bit patterned media for magnetic data recording.",

keywords = "bit patterned media, FePt nanoparticles, magnetic data recording, metallopolymers, nanoimprint lithography",

author = "Qingchen Dong and Guijun Li and Ho, {Cheuk Lam} and Mahtab Faisal and Leung, {Chi Wah} and Pong, {Philip Wing Tat} and Kun Liu and Tang, {Ben Zhong} and Ian Manners and Wong, {Wai Yeung}",

year = "2012",

month = feb,

day = "21",

doi = "10.1002/adma.201104171",

language = "English",

volume = "24",

pages = "1034--1040",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

number = "8",

}

TY - JOUR

T1 - A polyferroplatinyne precursor for the rapid fabrication of L10-FePt-type bit patterned media by nanoimprint lithography

AU - Dong, Qingchen

AU - Li, Guijun

AU - Ho, Cheuk Lam

AU - Faisal, Mahtab

AU - Leung, Chi Wah

AU - Pong, Philip Wing Tat

AU - Liu, Kun

AU - Tang, Ben Zhong

AU - Manners, Ian

AU - Wong, Wai Yeung

PY - 2012/2/21

Y1 - 2012/2/21

N2 - A polyferroplatinyne polymer can be patterned on the surface of Si wafer in ordered nanoline or nanodot shapes with PDMS molds through nanoimprint lithography (NIL), and subsequent thermal treatment gives rise to the nanopatterned arrays of L10-FePt nanoparticles with the same periodicities. The method offers excellent potential to be utilized in the simple and rapid fabrication of bit patterned media for magnetic data recording.

AB - A polyferroplatinyne polymer can be patterned on the surface of Si wafer in ordered nanoline or nanodot shapes with PDMS molds through nanoimprint lithography (NIL), and subsequent thermal treatment gives rise to the nanopatterned arrays of L10-FePt nanoparticles with the same periodicities. The method offers excellent potential to be utilized in the simple and rapid fabrication of bit patterned media for magnetic data recording.

KW - bit patterned media

KW - FePt nanoparticles

KW - magnetic data recording

KW - metallopolymers

KW - nanoimprint lithography

UR - http://www.scopus.com/inward/record.url?scp=84863115892&partnerID=8YFLogxK

U2 - 10.1002/adma.201104171

DO - 10.1002/adma.201104171

M3 - Journal article

C2 - 22290721

SN - 0935-9648

VL - 24

SP - 1034

EP - 1040

JO - Advanced Materials

JF - Advanced Materials

IS - 8

ER -