A performance tradeoff function for evaluating suggested parameters in the reactive ion etching process

H. C.W. Lau; C. X.H. Tang; B. P.K. Leung; Ka Man Lee; G. T.S. Ho

doi:10.1109/TSMCA.2009.2019877

A performance tradeoff function for evaluating suggested parameters in the reactive ion etching process

H. C.W. Lau, C. X.H. Tang, B. P.K. Leung, Ka Man Lee, G. T.S. Ho

The Hong Kong Polytechnic University

Research output: Journal article publication › Journal article › Academic research › peer-review

5 Citations (Scopus)

Abstract

Reactive ion etching (RIE) is a process in the fabrication of semiconductor devices. The ability to predict the influence of the process parameters of RIE is crucial in terms of machine performance as they may have a serious impact on product quality as well as on the probability of machine failure. To address this issue, this correspondence paper presents a novel performance tradeoff function for evaluating the overall suitability of adopting the predicted control parameters suggested by domain experts, taking into full consideration their impact on the performance of the machine involved. An experiment using the RIE machine is provided to validate the practicability of the proposed approach.

Original language	English
Pages (from-to)	933-938
Number of pages	6
Journal	IEEE Transactions on Systems, Man, and Cybernetics Part A:Systems and Humans
Volume	39
Issue number	4
DOIs	https://doi.org/10.1109/TSMCA.2009.2019877
Publication status	Published - 13 May 2009

Keywords

Global optimization
Inverted beta loss function
Machine performance
Process parameter setting

ASJC Scopus subject areas

Control and Systems Engineering
Software
Human-Computer Interaction
Computer Science Applications
Electrical and Electronic Engineering

More information

10.1109/TSMCA.2009.2019877

Cite this

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title = "A performance tradeoff function for evaluating suggested parameters in the reactive ion etching process",

abstract = "Reactive ion etching (RIE) is a process in the fabrication of semiconductor devices. The ability to predict the influence of the process parameters of RIE is crucial in terms of machine performance as they may have a serious impact on product quality as well as on the probability of machine failure. To address this issue, this correspondence paper presents a novel performance tradeoff function for evaluating the overall suitability of adopting the predicted control parameters suggested by domain experts, taking into full consideration their impact on the performance of the machine involved. An experiment using the RIE machine is provided to validate the practicability of the proposed approach.",

keywords = "Global optimization, Inverted beta loss function, Machine performance, Process parameter setting",

author = "Lau, {H. C.W.} and Tang, {C. X.H.} and Leung, {B. P.K.} and Lee, {Ka Man} and Ho, {G. T.S.}",

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A performance tradeoff function for evaluating suggested parameters in the reactive ion etching process. / Lau, H. C.W.; Tang, C. X.H.; Leung, B. P.K. et al.

In: IEEE Transactions on Systems, Man, and Cybernetics Part A:Systems and Humans, Vol. 39, No. 4, 13.05.2009, p. 933-938.

Research output: Journal article publication › Journal article › Academic research › peer-review

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AU - Lau, H. C.W.

AU - Tang, C. X.H.

AU - Leung, B. P.K.

AU - Lee, Ka Man

AU - Ho, G. T.S.

PY - 2009/5/13

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N2 - Reactive ion etching (RIE) is a process in the fabrication of semiconductor devices. The ability to predict the influence of the process parameters of RIE is crucial in terms of machine performance as they may have a serious impact on product quality as well as on the probability of machine failure. To address this issue, this correspondence paper presents a novel performance tradeoff function for evaluating the overall suitability of adopting the predicted control parameters suggested by domain experts, taking into full consideration their impact on the performance of the machine involved. An experiment using the RIE machine is provided to validate the practicability of the proposed approach.

AB - Reactive ion etching (RIE) is a process in the fabrication of semiconductor devices. The ability to predict the influence of the process parameters of RIE is crucial in terms of machine performance as they may have a serious impact on product quality as well as on the probability of machine failure. To address this issue, this correspondence paper presents a novel performance tradeoff function for evaluating the overall suitability of adopting the predicted control parameters suggested by domain experts, taking into full consideration their impact on the performance of the machine involved. An experiment using the RIE machine is provided to validate the practicability of the proposed approach.

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KW - Inverted beta loss function

KW - Machine performance

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DO - 10.1109/TSMCA.2009.2019877

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JO - IEEE Transactions on Systems, Man, and Cybernetics: Systems

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A performance tradeoff function for evaluating suggested parameters in the reactive ion etching process

Abstract

Keywords

ASJC Scopus subject areas

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