A performance tradeoff function for evaluating suggested parameters in the reactive ion etching process

H. C.W. Lau, C. X.H. Tang, B. P.K. Leung, Ka Man Lee, G. T.S. Ho

Research output: Journal article publicationJournal articleAcademic researchpeer-review

5 Citations (Scopus)


Reactive ion etching (RIE) is a process in the fabrication of semiconductor devices. The ability to predict the influence of the process parameters of RIE is crucial in terms of machine performance as they may have a serious impact on product quality as well as on the probability of machine failure. To address this issue, this correspondence paper presents a novel performance tradeoff function for evaluating the overall suitability of adopting the predicted control parameters suggested by domain experts, taking into full consideration their impact on the performance of the machine involved. An experiment using the RIE machine is provided to validate the practicability of the proposed approach.
Original languageEnglish
Pages (from-to)933-938
Number of pages6
JournalIEEE Transactions on Systems, Man, and Cybernetics Part A:Systems and Humans
Issue number4
Publication statusPublished - 13 May 2009


  • Global optimization
  • Inverted beta loss function
  • Machine performance
  • Process parameter setting

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Software
  • Human-Computer Interaction
  • Computer Science Applications
  • Electrical and Electronic Engineering

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