A novel magnetic field-assisted mass polishing of freeform surfaces

Chunjin Wang, Chi Fai Cheung, Lai Ting Ho, Kai Leung Yung, Lingbao Kong

Research output: Journal article publicationJournal articleAcademic researchpeer-review

46 Citations (Scopus)


This paper presents a novel magnetic field-assisted mass polishing (MAMP) technology for high-efficiency finishing of a number of freeform components simultaneously. The MAMP makes use of a rotational magnetic field applied outside an annular chamber which drives the magnetic abrasives to impinge on and remove material from the workpiece mounted inside the chamber. The influence of the magnetic field on the material removal characteristics is analysed by the finite element method. The factors affecting surface generation were studied through polishing experiments. Experimental results show that MAMP is effective for polishing of a number of freeform surfaces with nanometric surface finish.

Original languageEnglish
Article number116552
JournalJournal of Materials Processing Technology
Publication statusPublished - May 2020


  • Finishing
  • Freeform surfaces
  • Magnetic abrasive
  • Magnetic field assisted
  • Mass polishing
  • Ultra-precision machining

ASJC Scopus subject areas

  • Ceramics and Composites
  • Computer Science Applications
  • Metals and Alloys
  • Industrial and Manufacturing Engineering


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