A novel magnetic field-assisted mass polishing of freeform surfaces

Chunjin Wang; Chi Fai Cheung; Lai Ting Ho; Kai Leung Yung; Lingbao Kong

doi:10.1016/j.jmatprotec.2019.116552

A novel magnetic field-assisted mass polishing of freeform surfaces

Chunjin Wang, Chi Fai Cheung, Lai Ting Ho, Kai Leung Yung, Lingbao Kong

Research output: Journal article publication › Journal article › Academic research › peer-review

55 Citations (Scopus)

Abstract

This paper presents a novel magnetic field-assisted mass polishing (MAMP) technology for high-efficiency finishing of a number of freeform components simultaneously. The MAMP makes use of a rotational magnetic field applied outside an annular chamber which drives the magnetic abrasives to impinge on and remove material from the workpiece mounted inside the chamber. The influence of the magnetic field on the material removal characteristics is analysed by the finite element method. The factors affecting surface generation were studied through polishing experiments. Experimental results show that MAMP is effective for polishing of a number of freeform surfaces with nanometric surface finish.

Original language	English
Article number	116552
Journal	Journal of Materials Processing Technology
Volume	279
DOIs	https://doi.org/10.1016/j.jmatprotec.2019.116552
Publication status	Published - May 2020

Keywords

Finishing
Freeform surfaces
Magnetic abrasive
Magnetic field assisted
Mass polishing
Ultra-precision machining

ASJC Scopus subject areas

Ceramics and Composites
Computer Science Applications
Metals and Alloys
Industrial and Manufacturing Engineering

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10.1016/j.jmatprotec.2019.116552

http://hdl.handle.net/10397/92417

Cite this

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title = "A novel magnetic field-assisted mass polishing of freeform surfaces",

abstract = "This paper presents a novel magnetic field-assisted mass polishing (MAMP) technology for high-efficiency finishing of a number of freeform components simultaneously. The MAMP makes use of a rotational magnetic field applied outside an annular chamber which drives the magnetic abrasives to impinge on and remove material from the workpiece mounted inside the chamber. The influence of the magnetic field on the material removal characteristics is analysed by the finite element method. The factors affecting surface generation were studied through polishing experiments. Experimental results show that MAMP is effective for polishing of a number of freeform surfaces with nanometric surface finish.",

keywords = "Finishing, Freeform surfaces, Magnetic abrasive, Magnetic field assisted, Mass polishing, Ultra-precision machining",

author = "Chunjin Wang and Cheung, {Chi Fai} and Ho, {Lai Ting} and Yung, {Kai Leung} and Lingbao Kong",

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AU - Wang, Chunjin

AU - Cheung, Chi Fai

AU - Ho, Lai Ting

AU - Yung, Kai Leung

AU - Kong, Lingbao

PY - 2020/5

Y1 - 2020/5

N2 - This paper presents a novel magnetic field-assisted mass polishing (MAMP) technology for high-efficiency finishing of a number of freeform components simultaneously. The MAMP makes use of a rotational magnetic field applied outside an annular chamber which drives the magnetic abrasives to impinge on and remove material from the workpiece mounted inside the chamber. The influence of the magnetic field on the material removal characteristics is analysed by the finite element method. The factors affecting surface generation were studied through polishing experiments. Experimental results show that MAMP is effective for polishing of a number of freeform surfaces with nanometric surface finish.

AB - This paper presents a novel magnetic field-assisted mass polishing (MAMP) technology for high-efficiency finishing of a number of freeform components simultaneously. The MAMP makes use of a rotational magnetic field applied outside an annular chamber which drives the magnetic abrasives to impinge on and remove material from the workpiece mounted inside the chamber. The influence of the magnetic field on the material removal characteristics is analysed by the finite element method. The factors affecting surface generation were studied through polishing experiments. Experimental results show that MAMP is effective for polishing of a number of freeform surfaces with nanometric surface finish.

KW - Finishing

KW - Freeform surfaces

KW - Magnetic abrasive

KW - Magnetic field assisted

KW - Mass polishing

KW - Ultra-precision machining

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DO - 10.1016/j.jmatprotec.2019.116552

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SN - 0924-0136

VL - 279

JO - Journal of Materials Processing Technology

JF - Journal of Materials Processing Technology

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ER -

A novel magnetic field-assisted mass polishing of freeform surfaces

Abstract

Keywords

ASJC Scopus subject areas

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