A novel induction heater for chemical vapor deposition

Chung Wo Ong, H. K. Wong, K. S. Sin, S. T. Yip, K. P. Chik

Research output: Journal article publicationJournal articleAcademic researchpeer-review

4 Citations (Scopus)

Abstract

We report how an induction cooker for household use can be modified for heating substrate or heating gases to high temperature in a chemical vapor deposition system. Only minor changes of the cooker are necessary. Stable substrate temperature as high as 900 °C was achieved with input power of about 1150 W.
Original languageEnglish
Pages (from-to)1174-1176
Number of pages3
JournalReview of Scientific Instruments
Volume60
Issue number6
DOIs
Publication statusPublished - 1 Dec 1989
Externally publishedYes

ASJC Scopus subject areas

  • Instrumentation
  • Physics and Astronomy (miscellaneous)

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