A novel induction heater for chemical vapor deposition

Chung Wo Ong; H. K. Wong; K. S. Sin; S. T. Yip; K. P. Chik

doi:10.1063/1.1140281

A novel induction heater for chemical vapor deposition

Chung Wo Ong, H. K. Wong, K. S. Sin, S. T. Yip, K. P. Chik

Research output: Journal article publication › Journal article › Academic research › peer-review

4 Citations (Scopus)

Abstract

We report how an induction cooker for household use can be modified for heating substrate or heating gases to high temperature in a chemical vapor deposition system. Only minor changes of the cooker are necessary. Stable substrate temperature as high as 900 °C was achieved with input power of about 1150 W.

Original language	English
Pages (from-to)	1174-1176
Number of pages	3
Journal	Review of Scientific Instruments
Volume	60
Issue number	6
DOIs	https://doi.org/10.1063/1.1140281
Publication status	Published - 1 Dec 1989
Externally published	Yes

ASJC Scopus subject areas

Instrumentation
Physics and Astronomy (miscellaneous)

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10.1063/1.1140281

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title = "A novel induction heater for chemical vapor deposition",

abstract = "We report how an induction cooker for household use can be modified for heating substrate or heating gases to high temperature in a chemical vapor deposition system. Only minor changes of the cooker are necessary. Stable substrate temperature as high as 900 °C was achieved with input power of about 1150 W.",

author = "Ong, {Chung Wo} and Wong, {H. K.} and Sin, {K. S.} and Yip, {S. T.} and Chik, {K. P.}",

year = "1989",

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doi = "10.1063/1.1140281",

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T1 - A novel induction heater for chemical vapor deposition

AU - Ong, Chung Wo

AU - Wong, H. K.

AU - Sin, K. S.

AU - Yip, S. T.

AU - Chik, K. P.

PY - 1989/12/1

Y1 - 1989/12/1

N2 - We report how an induction cooker for household use can be modified for heating substrate or heating gases to high temperature in a chemical vapor deposition system. Only minor changes of the cooker are necessary. Stable substrate temperature as high as 900 °C was achieved with input power of about 1150 W.

AB - We report how an induction cooker for household use can be modified for heating substrate or heating gases to high temperature in a chemical vapor deposition system. Only minor changes of the cooker are necessary. Stable substrate temperature as high as 900 °C was achieved with input power of about 1150 W.

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U2 - 10.1063/1.1140281

DO - 10.1063/1.1140281

M3 - Journal article

SN - 0034-6748

VL - 60

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EP - 1176

JO - Review of Scientific Instruments

JF - Review of Scientific Instruments

IS - 6

ER -

A novel induction heater for chemical vapor deposition

Abstract

ASJC Scopus subject areas

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