Abstract
This paper describes a CMOS compatible integrated gas sensor. The device was designed so that the front-end fabrication is fully compatible with the standard CMOS process. The non-CMOS compatible fabrication steps were carried out as post-processing steps. This included the silicon anisotropic etch to create the thermally isolated micro-hotplate (MHP) and the deposition of gas-sensitive thin films using maskless r.f. SnO2sputtering. The sensors exhibited high sensitivities to gases, such as ethanol and hydrogen.
Original language | English |
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Pages (from-to) | 81-87 |
Number of pages | 7 |
Journal | Sensors and Actuators, B: Chemical |
Volume | 49 |
Issue number | 1-2 |
DOIs | |
Publication status | Published - 25 Jun 1998 |
Externally published | Yes |
Keywords
- Integrated gas sensor
- Lower power
- Maskless tin oxide sputtering
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Instrumentation
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Metals and Alloys
- Electrical and Electronic Engineering
- Materials Chemistry