A comparative study between pure and Al-containing amorphous carbon films prepared by FCVA technique together with high substrate pulse biasing

D. Sheeja, B. K. Tay, J. Y. Sze, L. J. Yu, Shu Ping Lau

Research output: Journal article publicationJournal articleAcademic researchpeer-review

26 Citations (Scopus)

Abstract

Intrinsic stress in the amorphous carbon films prepared by the filtered cathodic vacuum arc technique is relatively high and limits the thickness of the film. Effective stress reduction is obtained by depositing the film in conjunction with high substrate pulse biasing. Stress reduction is also attained, by incorporating a small percentage of metal ions in the films. In the present study, the properties of amorphous carbon films prepared with and without aluminium incorporation (a-C and a-C:Al) under substrate pulse biasing conditions at different frequencies are compared. The a-C:Al films exhibit deposition rates and intrinsic stress lower than pure a-C films. A stress reduction of approximately 85% can easily be obtained, for a-C films at higher pulse frequencies. The stress is further lowered by Al incorporation, but by sacrificing the smoothness, hardness and wear resistance.
Original languageEnglish
Pages (from-to)2032-2036
Number of pages5
JournalDiamond and Related Materials
Volume12
Issue number10-11
DOIs
Publication statusPublished - 1 Jan 2003
Externally publishedYes

Keywords

  • Filtered cathodic vacuum arc (FCVA) technique
  • Pulse frequency
  • Pulsed biasing
  • Pure and Al-containing amorphous carbon (a-C and a-C:Al) films

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Physics and Astronomy(all)
  • Materials Chemistry
  • Electrical and Electronic Engineering

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